. This "remote" method is widely preferred in industry because it reduces damage to the expensive components inside the main CVD chamber compared to in-situ cleaning MKS Instruments Key Technical Specifications Model Number AX7651-2 (ASTRON 2L) Approximately 52 kg (115 lbs) Primary Use Chamber cleaning and reactive gas production MKS Instruments Cleaning Agent Typically Nitrogen Trifluoride ( cap N cap F sub 3
Check for NF₃ flow fluctuations or contamination in the chamber.
But as any process engineer knows, having a powerful source is only half the battle. How you integrate it into your system determines whether you're getting 95% dissociation or fighting recombination losses. 1. The Power of Neutral Radicals Unlike in-situ plasma, the ASTRON 2L operates as a Remote Plasma Source (RPS) . It dissociates precursor gases—most commonly cap N cap F sub 3 mks astron 2l manual
What type does your tool use (DeviceNet, RS-232, Analog)? Share public link
Navigate to to assign the correct gauge model to Channel 1 and Channel 2. Configuring Setpoints How you integrate it into your system determines
The ASTRON 2L functions as a low-field toroidal RF plasma source MKS Instruments
Always use an ambient ozone monitor in the room. It dissociates precursor gases—most commonly cap N cap
The manual emphasizes: Switching emission current while the filament is on can cause an arc. Always turn the filament OFF first.
Maximizing Etch Efficiency: A Deep Dive into the MKS ASTRON 2L Remote Plasma Source
flow. Run the clean cycle at a post-ignition pressure of 1 to 10 Torr to optimize dissociation. Preventative Maintenance & Troubleshooting Routine Inspections Check the internal alumina ( Al2O3cap A l sub 2 cap O sub 3